The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 1983

Filed:

Jan. 08, 1981
Applicant:
Inventor:

Roy A Porter, Whitehall, PA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; H01L / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156656 ; 1566591 ; 156665 ; 2041 / ;
Abstract

A dry etching process for aluminum uses a silicon tetrachloride gas ambient to which is applied radio frequency power for ionizing the gas. By appropriate control of the gas pressure and power density, anisotropic etching is achieved. This gas system also is useful for etching dual layers of aluminum and doped polycrystalline silicon.


Find Patent Forward Citations

Loading…