The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 1983
Filed:
Dec. 31, 1979
Frans Brouwer, Glencoe, IL (US);
Other;
Abstract
An optical scanner for a pattern tracing system for scanning an irregular two-dimensional pattern using an optical beam deflection principle. A scanning head is non-rotatably mounted above the pattern on a frame moveable in two coordinate directions. The scanning head reflects an image onto the pattern by a pivotally mounted mirror in the scanning head and is deflected at high frequency in two normally orthogonal planes by the interaction of a pair of perpendicularly related electromagnets with a permanent magnet. The geometric axis of the mirror nutates around a scan axis to provide a generally circular scan image on the pattern. The axis about which the mirror nutates, referred to as the scan axis, is shiftable from a fixed reference axis to achieve offsets for the scan image to provide both forward offset and 'kerf' offset perpendicular to the forward offset. A control circuit derives out of phase alternating signals for the two scanner coils to cause this nutational motion of the mirror. The offset of the axis of nutation from the reference axis is effected by the application of direct current signals to these coils.