The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 1983
Filed:
Jul. 06, 1981
Applicant:
Inventors:
John W Medernach, Albuquerque, NM (US);
Ivan A Novak, Glen Ellyn, IL (US);
Harry D Bush, Palatine, IL (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
C03C / ;
U.S. Cl.
CPC ...
430 22 ; 430311 ; 430313 ; 430317 ; 430318 ; 430319 ; 430329 ;
Abstract
A method is provided for fabricating substantially vertically aligned patterns of material on the opposed surfaces of a transparent substrate by employing a single external mask.
Quick Actions:
Medernach, John. (1983). Method for fabricating aligned patterns on the opposed surfaces of a (U.S. Patent No. 4371598). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4371598
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile