The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 1983
Filed:
Feb. 25, 1980
Michel Lacombat, Paris, FR;
Georges Dubroeucq, Paris, FR;
Thomson-CSF, Paris, FR;
Abstract
An optical system for aligning two patterns particularly by photo-repetition in which a first pattern formed by two optical networks, disposed along two coordinate axes is illuminated by the image of a second pattern comprising two optical networks, forming a reference produced from the orders of diffraction. In a variation, the optical networks are formed from a series of parallel strokes whose thickness and spatial distribution in a first direction parallel to one of the coordinate axes are determined by a pseudo-random code; the strokes of the optical networks of the first pattern being furthermore interrupted periodically in a second direction orthogonal to the first direction so as to form an optical network with a constant pitch in this direction. The optical alignment system comprises means for detecting the intensity of a predetermined part of the orders of diffraction in the second direction.