The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 1983
Filed:
Aug. 03, 1981
Bernard Feinberg, Englishtown, NJ (US);
James W O'Neil, Howell, NJ (US);
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Process for dot-etching a photopolymer layer no more than 0.015 mm thick and O.D. greater than 3.0 in the 350 to 400 nm region containing tone correctable image comprised of polymeric dots and lines having hardened upper skin which rests on softer undervolume having less degree of polymerization or hardening wherein a staging solution comprising a film forming hydrocarbon resin Mn of 500 to 3000 containing greater than 50% by weight aliphatic hydrocarbons, 25 to 50% by weight; aliphatic hydrocarbon solvent inert to photopolymer layer, 50 to 75% by weight, and optionally a dye or colorant and/or particulate material is applied to areas desired to protect; the solution is dried; the dot and line image is reduced by undercutting by mechanical action with a solvent of the softer undervolume and removing hardened polymer from the edges of the image; and the stage is removed by solvent therefor.