The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 1983

Filed:

Jan. 08, 1981
Applicant:
Inventors:

Paul A Kohl, Chatham, NJ (US);

Frederick W Ostermayer, Jr, Chatham, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F / ;
U.S. Cl.
CPC ...
2041293 ; 20412943 ; 20412975 ; 20412995 ; 204D / ;
Abstract

A process is described for etching p-type semiconductors using a photoelectrochemical etching process. This etching process is highly advantageous because the etching site is highly defined by the incident light and the etching rate can be controlled in a number of ways including light intensity and electrode potential.


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