The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 1983
Filed:
Apr. 14, 1980
Applicant:
Inventors:
Michel X deBrebisson, Caen, FR;
Marc Tessier, Caen, FR;
Assignee:
U.S. Philips Corporation, Tarrytown, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
2956 / ; 29571 ; 2957 / ; 2957 / ; 29578 ; 148187 ; 357 34 ;
Abstract
A method of manufacturing integrated circuits by means of a multilayer mask. Etching of the layers of the mask comprises a lateral etching of the bottom layer so that at the edge of the auxiliary layer edges appear which are removed partly prior to forming an insulating layer and partly after the formation thereof, after which a remainder of a mask portion is also removed as a result of which removal apertures for the formation of zones are determined.
deBrebisson, Michel. (1983). Method of manufacturing integrated circuits by means of a multilayer mask (U.S. Patent No. 4368573). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4368573
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile