The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 1983
Filed:
Nov. 10, 1980
Erich Bayer, Trostberg, DE;
Dr. Johannes Heidenhain GmbH, Traunreut, DE;
Abstract
A process for photolithographically producing matt diffusion patterns is disclosed. The matt diffusion patterns can be formed along with opaque and transparent patterns on the same pattern carrier plate. According to this process, a photoexposure mask corresponding to the desired matt pattern is made by photolithography, which mask is then used in subsequent photolithographic processes to form the matt diffusion pattern on pattern carrier plates. The process of making the exposure mask involves forming a mask of a desired diffusion pattern, applying a photoresist layer to the mask, exposing the photoresist layer through a diffusion plate, developing the photoresist layer, applying an opaque layer to the mask, and removing the photoresist layer. In subsequent photolithographic processes the exposure mask is printed on transparent pattern carrier plates, and the exposed areas of the pattern carrier plates are deeply etched to form the matt diffusion patterns.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile