The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 1982
Filed:
Nov. 18, 1981
Shin-Etsu Chemical Co. Ltd., Tokyo, JP;
Abstract
The invention provides a novel continuous process for concurrently producing methyl chloride and organosiloxanes by the reaction of an organochlorosilane and methyl alcohol in an aqueous reaction medium at 70.degree. to 150.degree. C. Different from conventional processes, the aqueous reaction medium contains no catalyst so that the problems inherent to the use of a large amount of a catalyst can be avoided. In the inventive process, the feed rates of the reactants are controlled so as to keep the concentration of hydrogen chloride in the aqueous reaction medium not to exceed the azeotropic concentration thereof at the temperature and under the pressure of operation. These conditions are critical to reduce the loss of hydrogen chloride by dissipation into the gaseous phase resulting in a remarkably high yield of methyl chloride from the standpoint of both the conversion of chlorine content and the space-time yield of the reaction vessel. The inventive process is advantageous also in the excellent quality of the organosiloxane product and markedly decreased formation of dimethyl ether as an undesirable by-product.