The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1982
Filed:
Jun. 23, 1981
Applicant:
Inventors:
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427 40 ; 204169 ;
Abstract
A novel method is proposed for improving the surface properties or, in particular, for reducing accumulation of static electricity on the surface of a shaped article of a vinyl chloride-based resin. The inventive method comprises first exposing the surface of the shaped article to low temperature plasma of a gas having no polymerizability in plasma and then bringing the plasma-treated surface into contact with a liquid which is inert to the resin, e.g. water, or an aqueous solution containing a surface active agent. The effect of the inventive method is so strong and durable that the treated surface remains anti-static even after 12 months after the treatment.