The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1982
Filed:
Nov. 26, 1980
Dieter Hofmann, Cologne, DE;
Reiner Wechsung, Cologne, DE;
Leybold-Heraeus GmbH, Cologne, DE;
Abstract
Apparatus for monitoring a plasma process in which a plasma is formed to occupy a specified region, which apparatus is composed of: a mass spectrometer system including a mass analyzer having an ion inlet and an ion outlet and an ion detector disposed in operative association with the ion outlet; an output device connected to the detector for providing an output signal representative of the mass spectrum of ions observed by the mass spectrometer system; and an ion-optical system having an inlet opening located in the vicinity of the specified region and disposed for extracting ions from the plasma and focussing the ions thus extracted onto the ion inlet of the analyzer, whereby the output signal produced by the output device is representative of the mass spectrum of ions in the plasma.