The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1982

Filed:

Oct. 26, 1981
Applicant:
Inventor:

Bruce F Griffing, Schenectady, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156652 ; 156656 ; 1566591 ; 1566611 ; 156668 ; 2041 / ; 427 431 ; 430313 ; 430316 ; 430317 ; 430318 ;
Abstract

A method for producing high resolution pattern in a thick layer of polymeric plastic resist is described. The method uses a thin top layer of photo resist in which the desired pattern is formed. The pattern is transferred to a thin metallic inter-layer by wet etching the metallic layer and is subsequently transferred to the thick layer of polymeric plastic by reactive ion etching in oxygen.


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