The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1982
Filed:
Dec. 03, 1979
William J Thayer, III, Kent, WA (US);
Carmine J Artura, Kent, WA (US);
The Boeing Company, Seattle, WA (US);
Abstract
A method and apparatus for tailoring the concentration profiles of reactant and diluent species in the gas stream of a pulsed chemical laser provide a substantially uniform initial chemical reaction rate and index of refraction across the laser cavity. In the preferred embodiment, a gas stream is composed of the two reactant species, molecular hydrogen (or deuterium) and molecular fluorine, diluent species argon and helium, and a trace of oxygen as a preinitiation inhibitor. A substantially uniform initial chemical reaction rate within the laser cavity is obtained by tailoring the concentration profile of the fluorine across the cavity to compensate for the variation in absorption of UV initiation radiation across the cavity along the axis of initiation. The index of refraction of the gas mixture is kept constant within the cavity by varying the concentration of diluent gases to compensate for the variation in the index of refraction that would otherwise result from the tailoring of the fluorine concentration profile. A mathematical model of UV radiation absorption in the laser cavity is developed on the basis of the specific geometry of the laser cavity and its associated source of UV initiation radiation. A radiation absorption analysis is then performed to define the fluorine concentration profile that provides the desired degree of uniformity of the initial chemical reaction rate. An injector/mixer manifold provides a gas stream having the desired reactant gas concentration profile, as well as a diluent gas concentration profile which provides a uniform index of refraction across the reagent stream.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile