The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1982
Filed:
Dec. 19, 1980
Yoshihiko Mizuguchi, Tokyo, JP;
Masataka Akagawa, Tokyo, JP;
Kokusai Denshin Denwa Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention provides a bifocal reflector antenna with no aberration and a configuration process thereof wherein the two-dimensional Ray Lattice Method is extended to the three-dimensional method. By setting the central section curve of a subreflector or main reflector as an initial condition, the surface curves of the sub- and main reflectors are determined so that a ray from the focus to the antenna aperture can satisfy the reflection law and path length condition. The aberration over the antenna aperture is perfectly eliminated by using the new method.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile