The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1982
Filed:
Apr. 13, 1981
Applicant:
Inventor:
Peter J Silverman, Palo Alto, CA (US);
Assignee:
Intel Magnetics, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
2041 / ; 156643 ;
Abstract
A process is described for removing the rounded regions in a silicon dioxide layer particularly in a layer covering conductive members. The silicon dioxide layer is subjected to ion milling. The angle of incidence of the ions striking the rounded regions is greater than the angle of incidence in other regions of the layer. This causes more of the rounded regions to be removed, thereby providing a smoother, faceted surface. The process eliminates the need to taper the edges of the conductive members as done in the prior art.