The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1982
Filed:
Mar. 27, 1980
Yoshiharu Namba, Hirakata, JP;
Taketoshi Yonezawa, Minoo, JP;
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Abstract
A polishing method suitable for use in working a surface of a magnetic material such as materials of magnetic head into a mirror-finished surface. The work is placed in a treating liquid cell such that its surface to be worked is opposed by the surface of a lap. The treating liquid contains fine polishing grains of magnesium oxide as the polishing agent, by an amount less than 4 wt %, and may contain 10 to 30 wt % of glycerol for increasing the viscosity. As a relative movement occurs between the work and the lap, the treating liquid forms a state of a dynamic-pressure bearing between the opposing surfaces of the work and lap, so that the surface of the work is polished into mirror surface by the action of the magnesium oxide without contacting the lap directly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile