The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1982
Filed:
Feb. 12, 1981
Harold E McKelvey, Plymouth, MI (US);
Shatterproof Glass Corporation, Detroit, MI (US);
Abstract
A rotatable magnetron cathode sputtering apparatus for operation within an evacuable chamber for coating substrates that are also contained within said chamber. The cathode comprises an elongated cylindrical tube having a layer of the coating material or materials to be sputtered applied to the outer surface thereof. Magnetic means is mounted within the tube and includes at least one row of permanent U-shaped magnets extending lengthwise of the tube. The tube is horizontally disposed and rotatably mounted in the coating chamber such that it can be turned on its longitudinal axis relative to the magnets to selectively bring different portions or segments of the same sputtering material or different sputtering materials into sputtering position with respect to the magnets and within the magnetic field. Means is also provided for internally cooling the cathode.