The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1982
Filed:
Jun. 24, 1981
Seymour Calvert, San Diego, CA (US);
Air Pollution Technology, Inc., San Diego, CA (US);
Abstract
A scrubber device for removing finely divided contaminants including gases from a gas stream is disclosed. The device comprises a housing defining a pretreatment section, an implosion section, and a diffusion section. The pretreatment section includes an inlet for directing a gas stream therein and means which define an annular flow path between the pretreatment section and the implosion section for the gas stream. The implosion section is disposed in the housing and is configured such that as the gas stream flows through the annular passage, it is directed radially inward. Means for supplying a liquid to the implosion section is also included, such that as the gas stream passes through the implosion section, finely divided liquid particles are entrained in the gas stream. The diffusion section is configured to receive the gas stream from the implosion section and includes means for removing the finely divided liquid particles. The now clean gas stream is then directed out of the diffusion section. The associated method comprises using the scrubber device previously described and directing a stream of gas through it such that finely divided contaminants are removed by various mechanisms. By the use of the scrubber device and related method of the present invention, even finely divided contaminants in the order of micron or submicron size diameters can be removed.