The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1982
Filed:
Sep. 17, 1979
Applicant:
Inventor:
Tihiro Ohkawa, La Jolla, CA (US);
Assignee:
General Atomic Company, San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21B / ;
U.S. Cl.
CPC ...
376140 ; 376137 ; 376146 ;
Abstract
A method and apparatus for clearing thermal barrier regions of trapped ions in a tandem mirror fusion reactor apparatus utilizing a bend at each end of the cylindrical plasma chamber within which bend the thermal barrier is positioned. Ions trapped in said thermal barrier are caused by said bend to drift in a direction perpendicular to the incident magnetic field and the direction of centrifugal force, such that said ions are enabled to be collected in a divertor positioned along said ion drift path.