The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1982
Filed:
Jul. 29, 1980
Applicant:
Inventors:
Tatsumi Mizutani, Kokubunji, JP;
Norio Kanai, Kodaira, JP;
Kunio Harada, Hachioji, JP;
Hideo Komatsu, Hinodemachi, JP;
Shinya Iida, Tama, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; C23F / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2191 / ; 2191 / ; 156646 ; 156643 ; 250531 ; 250539 ; 2041 / ; 204164 ;
Abstract
A plasma etcher wherein the provision of a gas outlet directly in an etching chamber is avoided and wherein a subchamber having a sufficient capacity is connected to the etching chamber through a joint part, the gas outlet being provided in this subchamber. With the apparatus, the distribution of etching rates in plasma etching becomes uniform.