The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1982
Filed:
Nov. 05, 1980
Hisashi Kono, Ube, JP;
Kenji Terai, Ube, JP;
Masaki Hisadomi, Ube, JP;
Katumi Uemura, Ube, JP;
Sumio Ohta, Ube, JP;
Yoshiichi Yamamoto, Ube, JP;
Ube Industries, Ltd., , JP;
Abstract
Undesirable deposition of polyoxymethylene onto the inner wall of a polymerization reactor and onto a stirrer, which deposition is observed in the slurry polymerization of formaldehyde carried out in an inert organic liquid medium, can be minimized by carrying out the slurry polymerization in the presence of a polymerization catalyst prepared by bringing a metal chelate compound into contact with polyoxymethylene in an inert organic liquid medium in the presence of formaldehyde. Preferably, the slurry polymerization is carried out in the presence of, in addition to the above-mentioned polymerization catalyst, at least one polyvalent metal salt of an alkylsalicylic acid or of a dialkyl ester of sulfosuccinic acid. It is also preferable to use a tubular closed loop reactor equipped with an impeller wherein gaseous formaldehyde is blown into the reactor in a position located downstream from the impeller, while the catalyst-containing slurry is circulated therethrough.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile