The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1982
Filed:
Nov. 07, 1980
Applicant:
Inventor:
Shigeru Morita, Kawasaki, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
156612 ; 156614 ; 156D / ; 156D / ; 423344 ; 427 94 ; 148175 ;
Abstract
A vapor growth method of forming deposition film on a plurality of substrates disposed within a cylindrical reaction vessel by causing flow of reaction gas under a reduced pressure through the reaction vessel, in which the treated surfaces of substrates are inclined to the upstream side of the reaction gas flow with respect to the axis of the reaction vessel and the individual substrates but the most upstream side one are each shifted in position with respect to the preceding one in a direction perpendicular to the axis of the reaction vessel.