The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1982
Filed:
Feb. 26, 1979
Applicant:
Inventors:
Assignee:
Ricoh Company Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430100 ; 430122 ; 430903 ;
Abstract
A reverse development is performed with application of development bias voltage to a development sleeve at the time of development, and the polarity of the bias voltage is reversed or the bias voltage is reduced to zero at the time of non-development. Furthermore, positive images and negative images can be selectively formed by changing the voltage to be applied to a charge injection electrode, without changing the bias voltage to be applied to the development sleeve.