The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1982

Filed:

Oct. 27, 1980
Applicant:
Inventors:

Edward H Stupp, Spring Valley, NY (US);

Joseph Lalak, Briarcliff Manor, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156654 ;
Abstract

A method of manufacturing a target from a pyroelectric material exhibiting ferroelectric domains includes the steps of poling the target in a uniform direction and then etching a central region of the target to produce a thin target with a thick support rim around an outer edge. An apparatus for poling wafers of pyroelectric material includes two electrodes spaced a fixed distance apart by an electrode separator. The pyroelectric material is mounted in the separator at a fixed position between the electrodes. An electrically insulating liquid dielectric fills the spaces between the electrodes and the pyroelectric material in order to maximize the electric field across the material. A pyroelectric target produced by poling prior to etching exhibits reduced surface anomolies and improved image quality.


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