The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 1982
Filed:
Mar. 04, 1981
Applicant:
Inventors:
Koji Okumura, Rochester, NY (US);
Franklin D Saeva, Webster, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430296 ; 430311 ; 430313 ; 430318 ; 430319 ;
Abstract
A dry process for the manufacture of microelectronic devices from a work piece, which may be carried out entirely in a vacuum chamber, and which involves the coating of the work piece with a thin film of a monomer, selectively polymerizing the monomer according to a pattern of the microelectronic device desired, heating the layer of monomer to evaporate unpolymerized monomer to expose electronic circuit materials thereunder, removing the exposed electronic circuit materials, and stripping the polymerized monomer resist from the surface of the work piece.