The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 1982

Filed:

Feb. 19, 1981
Applicant:
Inventors:

Elsa Reichmanis, Piscataway, NJ (US);

Cletus W Wilkins, Jr, Plainfield, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430311 ; 430270 ; 430302 ; 20415922 ;
Abstract

A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.


Find Patent Forward Citations

Reichmanis, Elsa. (1982). Process of exposing and developing terpolymer photosensitive bodies (U.S. Patent No. 4343889). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4343889

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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