The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1982
Filed:
Jan. 12, 1981
Applicant:
Inventors:
Fumiki Murakami, Otake, JP;
Minoru Ikeda, Hiroshima, JP;
Takashi Tokutomi, Otake, JP;
Toshiharu Nakano, Otake, JP;
Assignee:
Mitsubishi Rayon Company, Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; B01D / ;
U.S. Cl.
CPC ...
55 93 ; 55 95 ; 55244 ; 261112 ; 261113 ;
Abstract
A method for continuously removing fine dust from gases which contain them, consisting of: introducing the gas at a gas linear velocity of 10 to 80 m/sec and a liquid at a rate such that the liquid-to-gas ratio; L/G, is 1 to 50 l/m.sup.3, in parallel, into slit(s) or hole(s) which are set in tray(s) causing impingement onto a baffle plate which is set beneath the tray; and then carrying away the fine dust particles from the gas by the liquid, which is separated from the gas, is disclosed, along with apparatus to effectuate the process.