The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1982
Filed:
Mar. 06, 1981
Applicant:
Inventors:
Walter C Davidson, Mahwah, NJ (US);
Richard V Porcelli, Yonkers, NY (US);
Assignee:
The Halcon SD Group, Inc., New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C01G / ;
U.S. Cl.
CPC ...
423 22 ; 252413 ; 252414 ; 252415 ; 260546 ; 260549 ;
Abstract
Residues are formed in the carbonylation of esters or ethers, particularly in the production of acetic anhydride or ethylidene diacetate. When such residues contain noble metal, typically rhodium, used as a catalyst, the noble metals must be recovered before the residues can be disposed of. The metal values are freed from the residues by treatment with amines, thereby enabling the rhodium to be extracted by subsequent contact with an aqueous halogen acid. The residues are pretreated with alkanols and concentrated by evaporation to improve the effect of such amine treatments.