The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1982
Filed:
Oct. 10, 1979
Kent N Maffitt, Minneapolis, MN (US);
Richard F Willson, Hudson, WI (US);
Minnesota Mining and Manufacturing Company, Saint Paul, MN (US);
Abstract
A method is disclosed for producing a micro structure on the surface of an article. The method comprises the steps of depositing a discontinuous coating of a material exhibiting a low rate of sputter etching on a substrate exhibiting a higher rate of sputter etching and differentially sputter etching the composite surface to produce a topography of pyramid-like micropedestals random in height and separation. The articles produced by this method are characterized by both the microstructured surface and by the detectable presence of the material exhibiting the lower rate of sputter etching. The microstructured surface results in the articles having uniform antireflecting properties over a large range of angles of incident light and over an extremely broad range of wavelengths, in which the antireflecting characteristic is obtained without an attendant increase in diffuse scattering. Also, the microstructured surface results in the articles being characterized by a high degree of adherence, such that the treated surface may be considered to be 'primed', thereby enabling the application of highly adherent coatings or layers thereon.