The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1982
Filed:
Oct. 24, 1980
Applicant:
Inventors:
Richard D Balanson, Morgan Hill, CA (US);
Nicholas J Clecak, San Jose, CA (US);
Barbara D Grant, San Jose, CA (US);
Augustus C Ouano, Santa Cruz, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430192 ; 430193 ; 430326 ; 524108 ;
Abstract
Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
Quick Actions:
Balanson, Richard. (1982). Ultra-violet lithographic resist composition and process (U.S. Patent No. 4339522). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4339522
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile