The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 1982

Filed:

Jul. 17, 1979
Applicant:
Inventors:

Fritz Sauter, Vienna, AT;

Otto Eberle, Ottobrunn, DE;

Beate Suss, Munich, DE;

Rudolf Weissgerber, Munich, DE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A01N / ; C07D / ;
U.S. Cl.
CPC ...
424263 ; 546346 ;
Abstract

A 1-(3-pyridyl)-2,2,2-trihaloethyl compound of the formula I ##STR1## in which n is 0 or 1, R represents methyl and X is iodide, R' represents a radical of the formula II ##STR2## wherein V, Y and Z each represent a chlorine or bromine atom, A represents a radical of the general formula III ##STR3## in which B' is oxygen or sulphur and B stands for a member of the group consisting of an aliphatic radical having from 1-10 C-atoms of the group consisting of alkenyl radicals and alkyl radicals of the branched and straight chain type, the phenyl radical, an aralkyl radical having from 7-12 C-atoms and an amino group of the general formula IV ##STR4## in which F and D are identical or different, and represent a member of the group consisting of hydrogen, aliphatic radicals of the branched or straight chain type and having from 1-10 C-atoms, the phenyl radical, a substituted phenyl radical containing at least one substituent selected from the group consisting of lower alkoxy, lower alkanoyl, lower alkyl ester, COOH, halogen, lower alkyl, halo lower alkyl, nitro, and hydroxyl, and aralkyl radicals having from 7-12 C-atoms. A also representing a sulphonyl group of the general formula-SO.sub.2 -B, in which B has the same meaning as in formula III. The invention also relates to fungicidal compositions containing the compound according to the invention as active ingredients.


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