The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 1982
Filed:
Jan. 07, 1980
Robert D Davis, Costa Mesa, CA (US);
Roy L Blizzard, Mission Viejo, CA (US);
Thermo Electron Corporation, Waltham, MA (US);
Abstract
A plasma method and apparatus produce oxide particles having average diameters determined by adjustment of process conditions. Feed material is fed into a dual chamber reaction zone in which a plasma environment is established to cause the feed material to be vaporized. Subsequently, effluent containing the vaporized feed from the reaction zone is passed into a quenching zone where it is subjected to a quenching medium, the volume, velocity and direction of which are adjustable to determine output particle size characteristics. Feed material may be an oxide per se or one which forms an oxide in situ through reduction and/or oxidation.