Pattern position detecting system

Abstract

A pattern position detecting system includes an image pickup device to pick up the image of an object which includes a target pattern which is to be detected. On the basis of the output of the pickup device, local patterns of the image surface are successively cut out and positional coordinates of the local patterns are successively generated to indicate the typical positions of each of these local patterns. The respective local patterns are then compared with a standard pattern having the same feature as that of the target pattern and the degree of coincidence therebetween is detected. The different degrees of coincidence of the local patterns in the vicinity of a particular local pattern are then compared so as to successively sample the local pattern whose degrees of coincidence become a maximum, and the positional coordinates and degrees of coincidence of the respective local patterns whose degrees of coincidence become a maximum are then stored. The positional coordinates fulfilling the positional relationship inherent to the target pattern from among the positional coordinates finally selected are then sampled and the sampled positional coordinates are identified as indicating a position of the target pattern.