The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 1982
Filed:
Dec. 01, 1978
Applicant:
Inventors:
Antonio C Pastor, Santa Monica, CA (US);
Ricardo C Pastor, Manhattan Beach, CA (US);
Gregory L Tangonan, Oxnard, CA (US);
Shi-Yin Wong, Santa Monica, CA (US);
Assignee:
Hughes Aircraft Company, Culver City, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
430272 ; 427 431 ; 427 44 ; 427 541 ; 427 86 ; 427 87 ; 427 96 ; 427 99 ; 4271261 ; 427226 ; 427229 ; 4272481 ; 427255 ; 4272554 ; 427256 ; 427271 ; 427272 ; 427273 ; 427282 ; 427164 ; 427165 ; 427166 ; 430270 ; 430302 ; 430311 ; 430321 ; 430322 ; 430330 ;
Abstract
The specification describes a process for depositing a film of controlled composition on a substrate by using a metallo-organic photoresist in which the organic portion is combusted by heating in a reactive atmosphere to leave a residual deposit of a desired substance on the substrate. The film may be formed as a patterned or unpatterned layer. In addition, the residual deposit may be subsequently subjected to a chemical reaction to alter its composition.