The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 1982
Filed:
Oct. 24, 1980
Applicant:
Inventors:
Nobuaki Hayashi, Hachioji, JP;
Motoo Akagi, Hinodemachi, JP;
Kiyoshi Miura, Mobara, JP;
Yoshiyuki Odaka, Isumimachi, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430 28 ; 430 25 ; 430 29 ; 430196 ; 430197 ; 430281 ; 430283 ; 430325 ; 430919 ;
Abstract
Disclosed are a photosensitive composition comprising a copolymer comprising acrylamide, diacetone-acrylamide and a sulfonated vinyl monomer, such as sodium p-styrenesulfonate, and a water-soluble aromatic bisazide compound, and a pattern-forming method using this photosensitive composition. This photosensitive composition has a reciprocity law failure, and when this photosensitive composition is used, the development after light exposure is completed in a short time.