The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 1982

Filed:

Jun. 01, 1981
Applicant:
Inventor:

Alfred Hirt, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
156643 ; 156644 ; 1566591 ; 427 431 ; 430-5 ; 430296 ; 430313 ; 430319 ;
Abstract

A method of manufacturing an electron emission aperture of an electron beam generator using the associated electron beam generator and the cathode of the generator which emits electrons at a plurality of points, as well as aperture lenses, and employing electron projection lithography. The associated electron beams are used to burn the emission spot pattern of the associated cathode into an electron-sensitive layer of a blank of a perforated mask, through holes in the mask are produced by etching at the burn spots, individual aperture spots corresponding to the emission spot pattern are burned into an electron-sensitive layer of a blank of the aperture through the through holes using the perforated mask and the associated electron beams, and the blind holes near the spots are etched allowing their individual apertures and a supporting grid to remain.


Find Patent Forward Citations

Loading…