The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 1982
Filed:
May. 16, 1980
James G Baker, Bedford, NH (US);
Abstract
Wide angle optical objectives for use in aerial mapping cameras to provide improved resolving power and improved contrast rendition derived from the pattern of glass types and lens data employed. The outermost elements are weakly positive menisci to produce an initial convergence of rays before the mating negative elements are introduced thereby keeping the physical length of the system within modest proportions. Strong negative elements lying outside of centrally located strong positive elements provide favorable illumination over a wide angle field. Wafer elements near the center of the system serve to minimize chromatic astigmatism and to reduce the actual sagittal depth of the aspherics. Wafers of high index flint glass are located next to the central stop in order to obtain good chromatic spherical correction in the tangential rays over the field.