The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1982
Filed:
Sep. 17, 1980
Applicant:
Inventor:
Riso Iwata, Tokyo, JP;
Assignee:
Nippon Zeon Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
526 79 ; 526283 ; 526308 ;
Abstract
In a process for producing a cyclopentadiene resin having a regulated softening point which comprises heat-copolymerizing a cyclopentadiene monomer and a comonomer copolymerizable therewith, the improvement which comprises polymerizing (A) a monomeric mixture having a low content of a cyclopentadiene monomer, then adding (B) a cyclopentadiene monomer or (C) a monomeric mixture having a high content of a cyclopentadiene monomer, and continuing the polymerization.
Iwata, Riso. (1982). Process for producing cyclopentadiene resin (U.S. Patent No. 4330448). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4330448
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile