The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 1982

Filed:

Apr. 30, 1980
Applicant:
Inventor:

Andrew Meulenberg, Jr, Gaithersburg, MD (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05F / ;
U.S. Cl.
CPC ...
361218 ; 244 / ; 428922 ;
Abstract

A dielectric film is provided with a metallic back layer for use as the outer layer in a multi layer 'thermal blanket' employed as part of the temperature control system for a spacecraft. The dielectric film is repeatedly punctured from the metallized side in order to produce a plurality of small holes, which collect a disproportionately large current from the plasma and adjacent charged surface. The rough edges of these holes also act to initiate frequent, small, field emissions, thereby preventing large surface potentials from building up in the presence of a 'hot' space plasma or electron beam environment.


Find Patent Forward Citations

Meulenberg, Jr, Andrew. (1982). Discharge suppressing dielectric film for use on spacecraft surfaces (U.S. Patent No. 4329731). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4329731

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…