The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1982
Filed:
Jun. 27, 1979
James F Nester, Ridgefield, CT (US);
The Perkin-Elmer Corporation, Norwalk, CT (US);
Abstract
A method for manufacturing X-ray lithography masks containing features smaller than 1 micron in size and having conductive or non-conductive substrates. The method involves the initial deposition, as by evaporation, of a very thin coating of a strong X-ray absorber such as gold. A layer of photoresist is applied to the initial gold layer and exposed and developed to remove the photoresist in the exposed areas. Thereafter, the mask is submerged in an electroless gold plating bath. I have discovered that metals suitable for electroless plating are autocatalytic in nature. Accordingly, additional gold from the bath is preferentially deposited on the exposed first gold layer and is permitted to build to the desired thickness.