The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 1982
Filed:
Jul. 28, 1980
James R Muenger, Beacon, NY (US);
Edward T Child, Tarrytown, NY (US);
Albert Brent, Huntington, NY (US);
Texaco Development Corporation, White Plains, NY (US);
Abstract
The hot raw synthesis gas stream leaving the reaction zone of a free flow partial oxidation gas generator at a temperature in the range of about 1800.degree. to 3000.degree. F. is passed through a first gas diversion and residue separation chamber where the velocity of the gas stream is reduced and its direction is diverted into a side transfer line. Solid material and molten slag separate by gravity from the gas stream. The hot gas stream is then introduced into second gas diversion and residue separation zone comprising at least one thermally insulated gas-solids impingement separation means were additional solid matter and slag is separated. For example, from about 2 to 8 thermally insulated gas-solids impingement separators may be employed which are connected in parallel and/or series. In one embodiment, about 0 to 20 vol. % of the hot gas stream may be passed through bottom outlets in said first and second gas diversion zones in order to prevent bridging. The hot gas stream from the second gas diversion zone is passed upwardly through a radiant cooling zone where additional solid matter is removed by gravity and the gas temperature is reduced to a temperature in the range of about 900.degree. to 1800.degree. F.