The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 1982
Filed:
Jul. 03, 1980
Thomson-CSF, Paris, FR;
Abstract
A process allowing the position and the dimensions of the grid of a field-effect transistor as well as the gaps between source and grid, grid and drain to be fixed as early as the first masking operation. To this end, a mask is formed comprising source, grid and drain windows by using a first insulating or semi-insulating material then the three windows are filled by means of a second material. The ohmic source and drain contacts are deposited in the corresponding windows reopened by selective etching of the second material effected after masking the first part of the layer situated above the non-reopened window. Second selective etching after masking of the contacts allows a Schottky-type grid contact to be deposited.