The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 1982
Filed:
May. 22, 1980
Applicant:
Inventors:
Richard A Corcoran, Colchester, VT (US);
William A Keenan, Montpelier, VT (US);
Demetrios Michaelides, South Burlington, VT (US);
Bob H Yun, Hopewell Jct., NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ; G01R / ;
U.S. Cl.
CPC ...
3241 / ; 324 / ; 3241 / ; 3241 / ;
Abstract
An apparatus for measuring the surface potential and impurity concentration in a semi-conductor body by monitoring the current flowing in a semiconductor body when the body is biased with a ramp voltage above its flat band voltage and summing the monitored current with the ramp voltage biasing the body. The apparatus provides direct measurement of surface potential and impurity concentration in a semiconductor structure and is especially useful in metal insulator semiconductor (MIS) structures.