The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 1982

Filed:

Mar. 03, 1980
Applicant:
Inventors:

Jesse L Beauchamp, Pasadena, CA (US);

Patricia M George, Pasadena, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; H05K / ;
U.S. Cl.
CPC ...
430296 ; 3461 / ; 346158 ; 427 38 ; 427 531 ; 427 541 ; 430298 ; 430 31 ; 427 431 ;
Abstract

A thin film of material such as metal is deposited on the surface of a substrate by placing a substrate (22) into a chamber (10) containing holder (12) cooled by heat exchanger 18. A beam (56) of U.V. light from the illumination source (42) is projected through monochromator (43), mask (46) and lens (16) onto a selected area (58) of the substrate at an energy level exceeding the photoemission threshold of the surface. A slow electron (60) is ejected from the surface into the capture zone (62). A compound AB such as iron pentacarbonyl from supply (30) is leaked into the chamber (10), enters the capture zone (60) to form a highly reactive deposition fragment A.sup.- which attaches to the surface and a dissociation fragment which is evacuated through outlet (14). The deposited fragment may further dissociate to form metal deposit.


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