The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1982
Filed:
Mar. 02, 1981
Applicant:
Inventor:
Gwendyline Y Chen, Wilmington, DE (US);
Assignee:
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430271 ; 430281 ; 430288 ; 430905 ; 430912 ; 20415915 ;
Abstract
Compatible photosensitive compositions, and elements made therefrom, comprising a solvent-soluble, thermoplastic, elastomeric, block copolymer, a nongaseous ethylenically unsaturated compound, and an addition polymerization initiator activatable by actinic light are useful in preparing printing plates, particularly flexographic printing plates, and other relief images.
Chen, Gwendyline. (1982). Photosensitive block copolymer composition and elements (U.S. Patent No. 4323636). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4323636
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile