The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 1982

Filed:

Jun. 20, 1979
Applicant:
Inventors:

Nathan K Meckel, La Mesa, CA (US);

Benjamin B Meckel, Del Mar, CA (US);

Assignee:

Deposition Technology, Inc., San Diego, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 2041 / ; 350164 ; 428472 ;
Abstract

A sputtered thin film coating characterized by a stepwise and/or variable refractive index as a function of film depth. By means of an in-line assembly of planar magnetrons, each magnetron essentially isolated from the others but for a region of sputtering overlap, select materials and combinations of said materials with reactive gases can be continuously deposited upon a dynamic substrate whereby to obtain pre-determined refractive index gradients. Substrates coated with an inhomogeneous thin film exhibit superior non-spectral reflective characteristics particularly desirable for architectural designs and applications.


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