The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 1982
Filed:
Feb. 23, 1979
Stephen R Ellebracht, Lake Jackson, TX (US);
Charles M Fairless, Midland, MI (US);
The Dow Chemical Company, Midland, MI (US);
Abstract
A VUV plasma atomic emission apparatus system and method is distinguished by the features of a plasma purge chamber about the plasma generated by the system, a chromator in optical communication and closed gaseous communication with said plasma, preferably through a common port in said plasma purge chamber, purge gas supply means for purging said chromator and ultimately said plasma purge chamber through said common port, vent means preferably operable by draft to continuously exhaust gases from said plasma purge chamber, and focusing means between the plasma and chromator for focusing light from an excited sample introduced into or near said plasma onto said chromator. The continuous gas purging feature establishes a steady state gaseous environment of minimum absorption characteristics to the specific wavelengths of interest, thus expanding the energy band that may be reliably detected (i.e., particularly the difficult 160-200 nanometer band), and which result is accomplished with excellent reproducibility of data and sensitivity.