The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 1982

Filed:

Dec. 04, 1980
Applicant:
Inventor:

Yves Ruedin, Saint-Blaise, CH;

Assignee:

Ebauches S.A., Neuchatel, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; B44C / ;
U.S. Cl.
CPC ...
430296 ; 430314 ; 430319 ; 430952 ; 156654 ; 1566591 ;
Abstract

The invention provides a method of manufacturing the substrate of an electrochromic display cell as a result of which the ionic conductor of the cell cannot come into contact with the transparent conductive elements which form part of this substrate. A transparent conductive layer, a layer of an electrochromic material and a layer of photosensitive material having a positive action are deposited in turn on a transparent plate. A network of conductive elements is formed by etching away the electrochromic layer and the conductive layer through a mask constituted by the photosensitive material which is selectively exposed and developed. The electrochromic material is then etched away through a second mask formed by the same photosensitive material selectively exposed and developed a second time. This second mask is also used for the deposition of a layer of dielectric material. The conductive elements are thus covered with a continuous layer of dielectric material and of electrochromic material.


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