The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 1982

Filed:

Nov. 01, 1979
Applicant:
Inventors:

Frederick Vratny, Berkeley Heights, NJ (US);

John M Andrews, Jr, Watchung, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D / ; C25D / ; C25D / ;
U.S. Cl.
CPC ...
204 29 ; 204 / ; 204 40 ;
Abstract

A fabrication process for making palladium-plated target anodes for X-ray lithographic systems is characterized by a unique sequence of surface preparation, plating and annealing steps. Anodes made by the process have been operated reliably at high-power levels for extended periods of time.


Find Patent Forward Citations

Vratny, Frederick. (1982). Fabrication of palladium anode for x-ray lithography (U.S. Patent No. 4319967). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4319967

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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