The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1982
Filed:
Sep. 05, 1979
Applicant:
Inventors:
Al F Tasch, Jr, Richardson, TX (US);
Horng-Sen Fu, Sunnyvale, CA (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
357 23 ; 357 54 ; 357 59 ; 357 63 ;
Abstract
A metal oxide semiconductor device having at least one level of polycrystalline silicon interconnects and novel insulation layers for multilevel interconnects. In one embodiment a layer of arsenic doped glass replaces the conventional phosphorus doped glass insulation layer. In other embodiments a layer of arsenic doped glass upon an undoped layer of silicon dioxide provides the insulation layer. Slow diffusing source-drain impurities along with these insulation layers provide minimum lateral source-drain diffusion.